基于有限元方法的齿科种植体氧化锆基台受力研究

发布时间：2018-03-30 11:57

本文选题：氧化锆基台　切入点：齿科种植体　出处：《稀有金属材料与工程》2015年S1期

【摘要】：对4.1 mm的straumann的齿科种植体和氧化锆基台系统进行研究,通过有限元方法对齿科种植体的受力情况进行模拟。分别采用钛合金一体基台,氧化锆一体基台和氧化锆基台搭配Ti-base的组合基台模型,通过有限元软件模拟30o施加300 N载荷的情况。根据计算结果,发现整套种植体系统受力最大的点都出现在种植体和基台接触的位置。在用氧化锆一体基台时,氧化锆内部的最大应力非常接近氧化锆材料的断裂强度,而增加了Ti-base后,氧化锆基台内部的应力则能得到极大的降低。
[Abstract]:The orthodontic implant and zirconia base system of 4.1 mm straumann were studied. The stress of dental implant was simulated by finite element method. The model of zirconia integrated base and zirconia base is combined with Ti-base. The 300N load applied by 30o is simulated by finite element software. It is found that the most stressed points of the whole implant system are in the contact position between the implant and the base. When the zirconia substrate is used, the maximum stress inside the zirconia is very close to the fracture strength of the zirconia material, and the Ti-base is increased. The stress inside the zirconia base can be greatly reduced.
【作者单位】：清华大学新型陶瓷与精细工艺国家重点实验室;
【基金】：国家科技支撑计划(2012BAI07B07)
【分类号】：R783.6

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