电子束与电阻复合蒸发法制备Zr-Cu非晶薄膜及性能表征

发布时间：2018-03-07 11:20

本文选题：Zr-Cu非晶薄膜　切入点：复合蒸发　出处：《材料导报》2015年12期 　论文类型：期刊论文

【摘要】：主要采用电子束蒸发与电阻蒸发复合镀膜系统制备Zr-Cu二元非晶薄膜,衬底基板无冷却装置。通过X射线衍射仪(XRD)、场发射透射电子显微镜(FE-TEM)、场发射扫描电子显微镜(FE-SEM)、微控四探针测量仪等仪器,系统地研究了样品沉积时间对薄膜厚度、微观结构、表面形貌以及电学性能的影响,另外还分析了与磁控溅射制备的Zr-Cu非晶样品的区别。结果显示,该复合镀膜技术制备的ZrxCu100-x非晶薄膜玻璃形成成分范围为x=30~85;薄膜的结构与性能对沉积时间比较敏感。样品随沉积时间的延长从非晶结构逐渐向非晶纳米晶复合结构转变;相比磁控溅射制备的薄膜样品,复合蒸发法制备的薄膜表面呈现较大尺寸的"团簇"形貌;样品的电阻率和方块电阻随沉积时间的延长逐渐减小。
[Abstract]:Zr-Cu binary amorphous films were prepared by the composite coating system of electron beam evaporation and resistance evaporation. There is no cooling device on substrate substrates. By means of X-ray diffractometer, field emission transmission electron microscope, field emission scanning electron microscope, FE-SEMU, microcontrolled four-probe measuring instrument, etc., the deposition time of the sample to the thickness and microstructure of the film has been systematically studied. The influence of surface morphology and electrical properties was also analyzed. The differences between amorphous Zr-Cu samples prepared by magnetron sputtering and the results showed that, The glass composition range of ZrxCu100-x amorphous films prepared by the composite coating technology is xan30855.The structure and properties of the films are sensitive to the deposition time, and the samples gradually change from amorphous structure to amorphous nanocrystalline composite structure with the increase of deposition time. Compared with the films prepared by magnetron sputtering, the surface of the films prepared by composite evaporation shows a larger "cluster" shape, and the resistivity and the square resistance of the films decrease with the increase of deposition time.
【作者单位】：合肥工业大学材料科学与工程学院;
【基金】：国家自然科学基金面上项目(51171055) 全国百篇优秀博士论文作者资助项目(201149)
【分类号】：TG139.8;TB383.2

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