AZ51镁合金交流微弧氧化膜层厚度的研究

发布时间：2018-06-23 14:10

  本文选题：AZ镁合金 + 交流微弧氧化　； 参考：《材料科学与工艺》2015年05期

【摘要】：在氢氧化钾和氟化钾组成的电解液中,采用交流微弧氧化处理技术对AZ51镁合金进行表面处理.研究了处理参数对陶瓷氧化膜层厚度的影响,确定了膜层的组织构成.结果表明:KOH浓度在300~400 g/L时,膜层厚度几乎随着KOH浓度的增加呈线性增长;KF浓度在400~1 000 g/L,膜层厚度增加最快;电压处于50~80 V时,能够促进膜层的快速生长;当电解液温度在20~70℃,随着电解液温度的升高,膜层厚度逐渐增加;膜层厚度随处理时间延长快速增长,超过100 s后趋于平缓.膜层主要由氟化镁和氧化镁组成,致密膜层的最大平均厚度约为30μm,膜层厚度超过30μm后,膜层将出现"沙化层".
[Abstract]:The surface of AZ51 magnesium alloy was treated by AC microarc oxidation in electrolyte composed of potassium hydroxide and potassium fluoride. The effect of treatment parameters on the thickness of ceramic oxide film was studied and the microstructure of the coating was determined. The results show that when the concentration of Koh is 300 ~ 400 g / L, the thickness of the film increases linearly with the increase of Koh concentration, and the KF concentration increases linearly at 400 ~ 1 000 g / L, the thickness of the film increases fastest when the voltage is 50 ~ 80 V, and the electrolyte temperature is 2070 鈩，

本文编号：2057383