能量过滤磁控溅射技术过滤电极结构对薄膜性能影响的研究

发布时间：2018-04-22 01:08

本文选题：磁控溅射 + 能量过滤磁控溅射　；参考：《郑州大学》2017年硕士论文

【摘要】：随着薄膜科学的发展和薄膜产业的进步,多种薄膜制备技术也取得了较快的发展。磁控溅射镀膜技术因具有很多的优点而被广泛应用,例如在表面微加工,表面改性,光学薄膜,半导体薄膜,微电子和光电子技术等领域。其优点为:薄膜致密度高与基片附着性好,均匀性好,沉积速率快,可方便地制取高熔点物质的薄膜,成膜面积大等。但它也有一些我们不可忽视的缺点,比如制备的薄膜表面粗糙,颗粒较大,均匀性欠佳,结构不够致密等等。为克服磁控溅射技术的上述缺点,我们对本实验室的CS-300磁控溅射镀膜机进行了改进,加装了一个网状过滤电极,在直流磁控溅射(DMS)基础上研发了一种改进的磁控溅射技术,称之为“能量过滤磁控溅射”(Energy Filtering Magnetron Sputtering,EFMS)技术,并且取得了良好的技术效果。本文利用磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术制备TiO2,ITO和ZnO薄膜,研究了能量过滤磁控溅射(EFMS)技术过滤电极网孔大小对薄膜结构和性能的影响,进而比较研究了传统磁控溅射(DMS)技术和能量过滤磁控溅射(EFMS)技术所制备薄膜的结构、光学性能和均一性。本文研究工作分为四部分,主要研究内容和结论如下:分别采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术制备了TiO2薄膜,利用扫描电子显微镜(STM),X射线衍射仪(XRD),分光光度计、椭偏仪对薄膜的形貌、结构、光学性能(透射率、折射率和消光系数)进行了表征。分析对比了直流磁控溅射(DMS)技术和采用不同大小网孔过滤电极条件下能量过滤磁控溅(EFMS)技术所制备镀膜的结晶性能、表面形貌以及光学性能。结果表明,当采用8目金属网过滤电极时TiO2薄膜的结晶质量最好,薄膜表面颗粒细小,粗糙度低;薄膜折射率随过滤电极网孔目数的增加而升高,消光系数降低。薄膜光学带隙受过滤电极网孔目数的影响不大。分别采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术制备了ITO薄膜,结果表明当采用4目金属网过滤电极时ITO薄膜的结晶性最好,采用8目和30目金属网过滤电极时薄膜表面颗粒较小;30目过滤电极时薄膜透射率最高,8目和30目过滤电极时薄膜折射率和消光系数较高。分别采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术制备了ZnO薄膜。结果表明,30目过滤电极时薄膜的结晶质量最好;30目和8目过滤电极时薄膜样品颗粒细小,没有出现明显的团簇现象;8目过滤电极时薄膜的透射率最高;薄膜光学带隙受过滤电极的影响不大。分别采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术在衬底架不同位置上制备了TiO2薄膜,分析对比了两种技术在大面积衬底内所制备薄膜的结构及光学均一性。结果显示,与DMS技术相比,EFMS技术制备的薄膜在大面积沉底范围内的结构及光学特性均一性均得到了改善。
[Abstract]:With the development of film science and film industry, many kinds of thin film preparation technology have made rapid development. Magnetron sputtering technology has been widely used in many fields such as surface microprocessing, surface modification, optical thin film, semiconductor film, microelectronics and optoelectronic technology. The advantages of high density film and substrate adhesion, good uniformity, fast deposition rate, easy preparation of high melting point materials, large film area and so on. However, it also has some shortcomings, such as rough surface, large particle size, poor uniformity, uncompact structure and so on. In order to overcome the above shortcomings of the magnetron sputtering technology, we have improved the CS-300 magnetron sputtering coating machine in our laboratory, installed a mesh filter electrode, and developed an improved magnetron sputtering technology on the basis of DC magnetron sputtering. It is called "Energy filter Magnetron sputtering" and has achieved good results. The technique of Energy Filtering Magnetron Sputtering / EFMS is called "Energy filter Magnetron sputtering" (EF-Magnetron sputtering). In this paper, TiO2ITO and ZnO thin films were prepared by magnetron sputtering and energy filtered magnetron sputtering. The effect of the pore size of the filter electrode on the structure and properties of the films was studied. Furthermore, the structure, optical properties and homogeneity of the films prepared by conventional magnetron sputtering (DMS) technique and energy filtered magnetron sputtering (EFMS) technique are compared. The research work is divided into four parts. The main contents and conclusions are as follows: TiO2 thin films were prepared by DC magnetron sputtering and energy filtered magnetron sputtering respectively. The TiO2 thin films were prepared by scanning electron microscope (SEM) and X-ray diffractometer (XRD). The morphology, structure and optical properties (transmittance, refractive index and extinction coefficient) of the films were characterized by ellipsometry. The crystallization, surface morphology and optical properties of the films prepared by DC magnetron sputtering (DMS) technique and energy filter magnetron spatter (EFMS) technique under different size mesh filter electrodes were analyzed and compared. The results show that when 8 mesh metal mesh filter electrode is used, the crystalline quality of TiO2 film is the best, the surface of the film is fine and the roughness is low, and the refractive index of the film increases with the increase of the mesh number of the filter electrode, and the extinction coefficient decreases. The optical band gap of the thin film is not affected by the mesh number of the filter electrode. ITO thin films were prepared by DC magnetron sputtering and energy filtered magnetron sputtering respectively. The results show that the crystallization of ITO films is the best when 4 mesh metal mesh filter electrodes are used. The film transmittance is the highest at 8 mesh and 30 mesh metal mesh filter electrode, and the film refractive index and extinction coefficient are higher when the film surface particles are smaller than 30 mesh filter electrode. ZnO thin films were prepared by DC magnetron sputtering and energy filtered magnetron sputtering respectively. The results show that the film crystal quality is the best at 30 mesh filter electrode and 8 mesh filter electrode, and the film transmittance is the highest when there is no obvious cluster phenomenon. The thin film optical band gap is not affected by the filter electrode. TiO2 thin films were prepared on different positions on substrates by DC magnetron sputtering and energy filtered magnetron sputtering respectively. The structure and optical homogeneity of the films deposited on large area substrates were analyzed and compared. The results show that compared with the DMS technique, the structure and optical properties of the films prepared by the DMS technique have been improved in the large area bottom range.
【学位授予单位】：郑州大学
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：O484

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