专利技术标准化的默示许可研究

发布时间：2018-10-30 11:31

【摘要】：专利与早期的技术标准不具有必然联系。标准化组织从防止专利侵权与降低标准的推广成本目的出发,尽可能避免将专利纳入技术标准中。但20世纪90年代以后,科技的发展使越来越多的高新技术成果被授予专利,标准化组织在制定标准时要绕开专利变得异常困难。将专利纳入技术标准,随着标准的广泛实施,专利权人通常获得了事实上的市场支配地位。因此,在技术标准制定和实施过程中,经专利权人同意甚至专利权人直接参与到标准制定中,将专利纳入标准以追求利益的最大化。此后相对人实施标准的行为,又通常被专利权人认为侵犯专利权利而起诉,标准实施人应诉时提出专利默示许可作为抗辩理由。基于专利技术标准化发生的诉讼与抗辩,解决案件的难点在于究竟应认定侵犯专利权还是认定构成专利默示许可。但是,我国现有专利法律法规中尚未将默示许可视为不侵犯专利权的抗辩理由。因此,我们需要在现行的专利政策、理论以及法律框架内寻找更好的解决途径。本文认为,在国际、国内技术标准化盛行的大背景下,研究基于专利技术标准化情形下默示许可法律规则的适用,能够为专利法律在适宜我国国情下的制度变革提供选择。因此,本文对专利技术标准化的默示许可法律问题进行了研究。正文共分技术标准制定中专利默示许可概述、比较法视角的默示许可制度、我国专利技术标准化的默示许可立法和实践分析及其规则构建四个部分:在本文的第一部分,针对技术标准制定中专利默示许可概述,说明专利技术标准化对许可的影响以及此情形适用默示许可规则的必要性。第二部分探讨的是比较法视角的专利默示许可制度。由于英国、德国、美国是专利默示许可理论起源较早,发展较为完善的国家。本部分通过借鉴研究英、德、美三国默示许可制度的起源和发展,为我国默示许可制度寻找理论支持,帮助解决专利技术标准化下实施许可的法律难题。第三部分是本文的重点,该部分阐述了我国关于专利默示许可的立法现状和发展趋势以及审判现状。首先,阐述和肯定了基于技术标准化情形将默示许可纳入侵权抗辩理由在法规层面上的发展进步,认为随着理论研究不断深入和司法实践的发展需要,将默示许可制度纳入专利法律法规之中仅是时机问题。其次,也正视我国面临的司法困境:即使诉讼中基于专利技术标准化主张默示许可的情形逐渐增多,国内专利法相关的明文法令仍无迹可寻,审判实践亦在探索与进步中未臻成熟,立法层面的欠缺加重了审判的不确定性。第四部分是本文的最后一部分,是我国专利技术标准化的默示许可规则构建部分,探讨了技术标准制定中专利默示许可的法律适用问题,提出了我国相关法律规范立法完善的建议。
[Abstract]:Patents are not necessarily related to early technical standards. In order to prevent patent infringement and reduce the cost of standard promotion, ISO avoids the incorporation of patent into technical standard as far as possible. However, since 1990s, more and more new and high-tech achievements have been granted patents with the development of science and technology. Patents are incorporated into technical standards, and as standards are widely applied, patentees usually gain de facto market dominance. Therefore, in the process of making and implementing the technical standard, the patentee agrees and even the patentee directly participates in the establishment of the standard, and brings the patent into the standard in order to pursue the maximization of the benefit. Thereafter, the act of enforcing the standard by the relative party is usually sued by the patentee for infringement of the patent right, and the standard implementer puts forward the patent implied license as the defense when responding to the suit. Based on the litigation and defense of patent technology standardization, the difficulty of solving cases lies in whether patent infringement or patent implied license should be recognized. However, the implied license has not been regarded as the defense of patent right infringement in the current patent laws and regulations of our country. Therefore, we need to find a better solution within the current patent policy, theory and legal framework. This paper holds that, under the background of the prevalence of international and domestic technology standardization, the study on the application of implied licensing rules based on patent technology standardization can provide an option for patent law to be reformed in a system suitable for China's national conditions. Therefore, this paper has carried on the research to the patent technology standardization implied license legal question. The text is divided into four parts: the outline of patent implied licensing in the formulation of technical standards, the implied licensing system from the perspective of comparative law, the legislation and practice analysis of patent technology standardization in China and the construction of its rules: in the first part of this paper, In view of the outline of patent implied licensing in technical standard making, this paper explains the impact of patent technology standardization on licensing and the necessity of applying implied licensing rules in this situation. The second part discusses the patent implied licensing system from the perspective of comparative law. Because of England, Germany and America, patent implied license theory originated earlier and developed well. By studying the origin and development of implied licensing system in Britain, Germany and the United States, this part seeks theoretical support for China's implied licensing system and helps to solve the legal problems of licensing under patent technology standardization. The third part is the focus of this paper, this part expounds the legislation and development trend of patent implied license and the current situation of trial in China. First of all, the paper expounds and affirms the development and progress of tacit license in tort defense on the basis of technology standardization, and holds that with the deepening of theoretical research and the need of the development of judicial practice, It is only a matter of timing to bring the implied license system into patent laws and regulations. Secondly, we should also face up to the judicial dilemma in our country: even though the cases of implied licensing based on patent technology standardization in litigation are gradually increasing, there is still no trace of the explicit laws and decrees related to domestic patent law. Trial practice is not mature in exploration and progress, and the lack of legislation exacerbates the uncertainty of trial. The fourth part is the last part of this paper, which is the construction of implied licensing rules of patent technology standardization in China, and discusses the legal application of patent implied licensing in the formulation of technical standards. Some suggestions are put forward to perfect the relevant laws and regulations of our country.
【学位授予单位】：西南政法大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：D923.42

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