激光直写法制备仿刚毛微纳阵列的研究

发布时间：2018-02-22 21:13

本文关键词： 壁虎刚毛微制造二级结构激光直写　出处：《南京航空航天大学》2011年硕士论文　论文类型：学位论文

【摘要】：爬壁机器人能实现3维空间无障碍运动,设计并制备具有壁虎刚毛优点的粘附阵列,对爬壁机器人的研制和发展具有重要意义。本文提出了一种制备微纳阵列的新方法,以干膜为阵列材料,采用激光直写技术,制备仿壁虎刚毛微阵列。激光直写制备微纳阵列的方法具有高效率,低成本的优点,为软材料复杂微纳结构的制备提供了高效的方法和途径。主要研究内容如下: 1、采用激光直写技术进行一级阵列的制备,并进行制备参数选择的试验研究。在阵列制备过程中,多次覆膜以满足各级阵列高度要求,曝光时间和显影时间的配合决定了阵列各级的轴向高度,计算机输入的平面图形尺寸决定阵列直径,设计图形的排列方式和曝光步距共同决定阵列疏密程度;制备过程由计算机控制完成。试验制备出具有不同直径和高度的一级结构阵列。制备试验的同时,分析了曝光时间、显影时间等参数对阵列制备的影响,并得到曝光深度、显影深度与时间的数值关系,为后续研究提供理论基础。 2、在一级结构的基础上探索制备二级结构微纳阵列的方法。制备二级结构采用的方法包括一,自下而上;二,自上而下;其中“自下而上”法分为“两次曝光,两次显影”和“两次曝光,一次显影”两种方案。试验采用以上方法制备出不同结构和尺寸的二级结构阵列,其中“自上而下”的方法通过对曝光时间和显影时间的控制使第二级结构扎根于第一级结构中,有效的提高了两级结构间的连接强度。 3、在UMT-2摩擦试验机(CETR,USA)设备上进行了一级结构阵列的粘附性能试验,测试微粘附阵列在不同预压力条件下的粘附性能,分析了高度、直径、密度和曝光时间对粘附性能的影响,结果表明随着阵列高度的增加、密度的增大和直径的减小,阵列粘附性能随之增加。曝光时间的增加在一定范围内也提高了阵列粘附力。
[Abstract]:The wall climbing robot can realize the three-dimensional space without obstacle movement. The adhesion array with the advantages of gecko bristles is designed and fabricated, which is of great significance to the research and development of wall climbing robot. In this paper, a new method for fabricating micro and nano arrays is proposed. Using dry film as array material and laser direct-writing technology, a new method for fabricating a gecko hair microarray was developed. The method of laser direct-writing to fabricate micro-nano array has the advantages of high efficiency and low cost. It provides an efficient method and approach for the preparation of complex nanostructures of soft materials. The main research contents are as follows:. 1. The laser direct-writing technique was used to prepare the first order array, and the experimental study on the selection of the preparation parameters was carried out. In the process of preparing the array, the film was coated many times to meet the requirements of the array height at all levels. The combination of exposure time and development time determines the axial height of the array at all levels, the size of the plane figure input by the computer determines the diameter of the array, and the arrangement of the design pattern and the exposure step together determine the density degree of the array. The preparation process was controlled by computer. The first order structure array with different diameters and heights was prepared. The effects of exposure time and development time on the preparation of the array were analyzed, and the exposure depth was obtained. The numerical relationship between development depth and time provides a theoretical basis for further study. 2. On the basis of the primary structure, we explore the method of fabricating the secondary structure micro-nano array. The methods used in the preparation of the secondary structure include: first, bottom-up; second, top-down; the "bottom-up" method is divided into "two exposures," The two schemes of "twice development" and "two exposures" and "one development" were used to prepare secondary structure arrays with different structures and sizes. By controlling the exposure time and the development time, the "top-down" method makes the secondary structure take root in the first stage structure, which effectively enhances the connection strength between the two levels of structure. 3. The adhesion performance of the primary structure array was tested on the UMT-2 friction tester CET USA. The adhesion properties of the microadhesion array under different prepressure conditions were tested, and the effects of height, diameter, density and exposure time on the adhesion performance were analyzed. The results show that with the increase of the height of the array, the increase of the density and the decrease of the diameter, the adhesion of the array increases, and the exposure time increases the adhesion of the array to a certain extent.
【学位授予单位】：南京航空航天大学
【学位级别】：硕士
【学位授予年份】：2011
【分类号】：TP242;TN249

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