高温化学气相沉积法制备致密碳化钽涂层

发布时间：2018-05-17 17:04

本文选题：高温CVD + TaC涂层　；参考：《功能材料》2017年06期

【摘要】：采用高温化学气相沉积法(CVD)在高纯高密石墨基片的表面沉积了碳化钽(TaC)涂层。通过研究气化温度、气体流量及沉积温度对TaC涂层表面质量的影响,确定了高温CVD法制备TaC涂层的工艺参数,最终获得高致密度的TaC涂层。
[Abstract]:Tantalum carbide TaC coating was deposited on the surface of high purity and high density graphite substrate by high temperature chemical vapor deposition (CVD). By studying the influence of gasification temperature, gas flow rate and deposition temperature on the surface quality of TaC coating, the process parameters of TaC coating prepared by high temperature CVD method were determined, and the high density TaC coating was obtained.
【作者单位】：中国电子科技集团公司第四十六研究所;
【分类号】：TB306

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