溶液沉积法制备层状金属氧化物或金属氢氧化物
发布时间：2019-08-06 12:56
【摘要】：正采用溶液沉积法,即将前驱体溶液加至基体表面,该前驱体至少由第一金属氧化物、第一金属氢氧化物或二者的混合物组成[如ZnO、Zn(OH)_2、NiO、Ni(OH)_2、CuO、Cu(OH)_2等]。在100~600℃下加热,蒸发后前驱体溶液在基体上形成含有上述金属氧化物或金属氢氧化物的固态晶体层,层厚度为2~20 nm。US,9702054
[Abstract]:The precursor solution is added to the surface of the matrix by solution deposition method. The precursor is composed of at least the first metal oxide, the first metal hydroxide or a mixture of the two [such as ZnO,Zn (OH) _ 2, Nio, Ni (OH) _ 2, cuo, Cu (OH) _ 2, etc.]. The solid crystal layer containing the metal oxide or metal hydroxide is formed on the matrix after evaporation at 100 鈩，
本文编号：2523559
[Abstract]:The precursor solution is added to the surface of the matrix by solution deposition method. The precursor is composed of at least the first metal oxide, the first metal hydroxide or a mixture of the two [such as ZnO,Zn (OH) _ 2, Nio, Ni (OH) _ 2, cuo, Cu (OH) _ 2, etc.]. The solid crystal layer containing the metal oxide or metal hydroxide is formed on the matrix after evaporation at 100 鈩，
本文编号：2523559
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