基于表面等离子体共振腔的超分辨成像方法研究

发布时间：2018-09-11 09:09

【摘要】：传统光学成像系统存在衍射极限,其本质是由于携带物体亚波长结构的光场信息由倏逝波携带,由于倏逝波在成像过程当中的指数型衰减特性,使得光学显微镜的分辨率一直在半个照明波长左右。近些年来,随着表面等离子体光学的发展,可以实现操纵倏逝波参与到成像过程中去,为超分辨成像及超分辨光刻的研究提供了重要依据。本文开展了关于提升超分辨成像与光刻分辨率的方法研究,设计了表面等离子体共振腔结构,实现了倏逝波信息在成像过程当中的放大和增强传输,进而突破衍射极限,提升成像分辨率。围绕表面等离子体共振腔结构,本文主要研究了以下两方面内容:实现透明位相型物体的远场超分辨相衬成像;结合SP波照明结构拓展接触式光刻工作距,提升光刻分辨率。论文的主要成果如下:1、开展了对于透明位相型物体的远场超分辨相衬成像的行为与理论研究。分析了Hyperlens的相衬成像原理,设计了基于表面等离子体共振腔的Hyperlens结构用于实现透明物体相衬成像对比度的进一步提升。数值计算模拟证明了该结构在365nm波长入射下可以实现半周期为λ/10的分辨率,并且折射率差分辨率可以达到0.15。2、介绍了表面等离子体波的激发方式,并且开展了表面等离子体共振腔对于分辨力提升的原理分析。设计了基于表面等离子体共振腔的SP波照明光刻结构,实现了分辨力增强以及拓展工作距的效果,其半周期的分辨率可以达到32nm。并且在特征尺寸为60nm的光栅掩模图形中,可以将其空气工作距拓展到120nm,是传统近场光刻技术的十倍左右。同时,相对于传统棱镜浸没离轴照明光刻技术,进一步改善了光栅图形成像的均匀性。
[Abstract]:There is diffraction limit in traditional optical imaging system, the essence of which is that the information of light field carrying subwavelength structure of object is carried by evanescent wave and the exponential attenuation characteristic of evanescent wave in imaging process. The resolution of the optical microscope is always about half the illuminating wavelength. In recent years, with the development of surface plasma optics, it is possible to control evanescent waves to participate in the imaging process, which provides an important basis for the study of super-resolution imaging and super-resolution lithography. In this paper, the methods of raising super-resolution imaging and photolithographic resolution are studied, and the structure of surface plasmon resonance cavity is designed to amplify and enhance the propagation of evanescent wave information in the imaging process, thus breaking through the diffraction limit. Enhance imaging resolution. Focusing on the structure of the surface plasmon resonance cavity, this paper mainly studies the following two aspects: to realize the far-field super-resolution phase contrast imaging of transparent phase objects; to expand the contact lithography working distance and improve the lithographic resolution by combining the SP wave illumination structure. The main achievements of this paper are as follows: 1. The behavior and theory of far-field super-resolution phase contrast imaging for transparent phase objects are studied. The principle of phase contrast imaging of Hyperlens is analyzed and the Hyperlens structure based on surface plasmon resonance cavity is designed to further enhance the contrast of phase contrast imaging of transparent objects. Numerical simulation shows that the structure can achieve a half-period 位 / 10 resolution at 365nm wavelength incidence, and the resolution of refractive index difference can reach 0.15.2. The excitation mode of surface plasma wave is introduced. The principle of the resolution enhancement in the surface plasmon resonance cavity is analyzed. The SP wave illumination lithography structure based on the surface plasmon resonance cavity is designed. The resolution is enhanced and the working distance is extended. The half-period resolution can reach 32nmm. In the grating mask pattern with feature size of 60nm, the air working distance can be extended to 120 nm, which is about ten times that of the traditional near-field lithography. At the same time, compared with the traditional prism immersion off-axis illumination lithography technology, the image uniformity of grating image is further improved.
【学位授予单位】：中国科学院大学(中国科学院光电技术研究所)
【学位级别】：硕士
【学位授予年份】：2017
【分类号】：O53

【相似文献】