双靶直流溅射多层膜的叠加结构对沉积扩散法制备高硅钢硅含量的影响

发布时间：2018-10-09 18:00

【摘要】：以低硅钢片为基底(Fe-3%质量比Si),采用双靶直流共焦溅射不同叠加结构的硅-铁多层膜系(Fe-Si),然后在高真空下热扩散处理2 h得到高硅钢。研究了交替沉积、叠加周期性结构多层膜对热处理扩散硅含量的影响。用X射线衍射对样品进行物相分析,得出不同硅铁合金相(Fe-Si)的形成强烈依赖于前期膜沉积结构,周期性交替沉积Fe、Si膜时更有利于形成硅铁B2、DO_3相结构。用扫描电镜及能量散射谱观察了样品的断面微观形貌并测定硅含量沿断面深度分布关系,发现硅含量始终在断面中心低、两边高,且不同叠加结构膜系下的样品硅含量也不一样,选择合适的Fe、Si交替沉积膜系有利于硅的扩散。分别测量了不同叠加结构膜系下样品的电阻率、密度、断面显微硬度值,结果显示硅含量越高电阻率约大、硬度越高、密度越小。
[Abstract]:Si-Fe multilayer films (Fe-Si) with different superposition structures were prepared by double target direct current confocal sputtering (Fe-Si) on low silicon steel substrate (Fe-3% mass ratio Si),). The high silicon steel was obtained by thermal diffusion treatment in high vacuum for 2 h. The effect of alternate deposition and superposition of periodic multilayers on the content of diffused silicon in heat treatment was studied. The phase analysis of samples by X-ray diffraction shows that the formation of different Si-Fe alloy phases (Fe-Si) is strongly dependent on the deposition structure of the pre-deposited films, and the periodic alternate deposition of Fe,Si films is more favorable to the formation of Si-Fe B _ 2O _ 3 phase structure. Scanning electron microscopy and energy scattering spectroscopy were used to observe the microstructure of the samples and to determine the distribution of silicon content along the depth of the section. It was found that the silicon content was always low in the center of the section and high on both sides. The silicon content of the samples with different superposition structure is different, and the suitable Fe,Si alternate deposition system is beneficial to the silicon diffusion. The resistivity density and microhardness of different superimposed structure films were measured respectively. The results showed that the higher the silicon content the higher the hardness and density.
【作者单位】：兰州交通大学国家绿色镀膜技术与装备工程技术研究中心;兰州交通大学光电技术与智能控制教育部重点实验室;常州大成绿色镀膜科技有限公司;
【基金】：国家自然科学基金资助项目(51461028) 国家科技支撑计划(2014BAF01B02)
【分类号】：TG174.4

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